M. LOEFFLER

M. LOEFFLER

Universität Erlangen-Nurnberg, Germany.

Long-stay Visiting Researcher

Research Topic
Co nanostructures on vicinal Si surfaces. Vicinal surfaces with high density of steps are natural templates for the growth of regular arrays of dots, wires and stripes. In this project we have studied by means of Scanning Tunneling Microscopy the reactive deposition epitaxy of cobalt silicides on vicinal Si(111) substrates. Contrary to initial expectations, the growth process is simplified with respect to the flat surface. A single precursor species, i.e. the Co ring structure, leads to a rapid buil up of silicide clusters, regularly spaced along the steps, although incoherently arranged across the terraces. Currently we are analyzing more quantitatively the different morphologies and stoichiometries observed as a function of coverage and deposition temperature.
Last Check-in - Check-out date
02/04/2002 - 30/09/2002